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ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz Excimer Laser Gas cylinder

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ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz

Excimer laser gas mixtures are a combination of rare gases (argon,krypton, xenon, or neon) and halogen gases (fluorine or chlorine). The mixture of gases determines the wavelength of DUV light produced. Argon+fluorine+neon (193nm) and Krypton+fluorine+neon (248nm) are the two most common mixtures used. In terms of volume; neon makes up approximately 96–97.5% of the mixture.

Category
Component (%)
Balance Gas
He-Ne Laser Mixture Gas
2~8.3 Ne
He
CO2 Laser Mixture Gas
0.4H2+ 13.5CO2+ 4.5Kr
/
0.4 H2+ 13CO2+ 7Kr+ 2CO
0.4 H2+ 8CO2+ 8Kr+ 4CO
0.4 H2+ 6CO2+ 8Kr+ 2CO
0.4 H2+ 16CO2+ 16Kr+ 4CO
0.4 H2+ 8~12CO2+ 8~12Kr
Kr-F2 Laser Mixture Gas
5 Kr+ 10 F2
/
5 Kr+ 1~0.2 F2
Sealed Beam Laser Gas
18.5N2+ 3Xe+ 2.5CO
/
Excimer Laser
25.8Ne+ 9.8Ar+ 0.004N2+ 1F2
Ar
25.8Ne+ 9.8Ar+ 0.004N2+ 5F2
He
25.8Ne+ 9.8Ar+ 0.004N2+ 0.2F2
He
25.8Ne+ 9.8Ar+ 0.004N2+ 5HCl
A
   Excimer gases for partial models
Brand
Wavelength
Cylinder
Valve
COHERENT
193nm
20 L
DIN 8
B & L
193nm
20 L/50 L
DIN 8/ DIN 14
ZEISS
193nm
10L/20 L
DIN 8
VISX
193nm
16 L
CGA 679
NIDEK
193nm
16 L
CGA 679
LASERSIGHT
193nm
10 L
CGA 679
Alcon
193nm
16 L
CGA 679
SCHWIND
193nm
20 L
DIN 8/ DIN 14
SUMMIT
193nm
16 L
CGA 679

Other applications of ArF laser include the production of semiconductor integrated circuits. It also facilitates in situ analysis of mineral samples based on the ablation process.

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