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High Purity Gases For Electronics Monofluoromethane 99.999% FC41 UN 2454 Halocarbon 41 Methyl Fluoride CH3F
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High Purity Gases For Electronics Monofluoromethane 99.999% FC41 UN 2454 Halocarbon 41 Methyl Fluoride CH3F
AGEM produce and sell high-purity Monofluoromethane gas (CH3F) to be used in the manufacturing process of semiconductor chips.
Fluoromethane, also known as methyl fluoride, Freon 41, Halocarbon-41 and HFC-41,is a non-toxic, liquefiable gas at standard temperature and pressure. It is made of carbon, hydrogen, and fluorine. The name stems from the fact that it is methane (CH4) with a fluorine atom substituted for one of the hydrogen atoms. It is used in semiconductor manufacturing processes as an etching gas in plasma etch reactors.
Fluoromethane, more commonly called methyl fluoride (MeF) or Halocarbon 41 is a non-toxic liquefiable gas used in the manufacture of semiconductor and electronic products. In the presence of a RF field it dissociates into fluorine ions for selective etching of silicon compound films.
Application:CH3F is a specialty gas used in the manufacturing process of semiconductor chips for micromachining nitride film by etching. CH3F is mainly used in the manufacture of semiconductor memory chips including NAND flash and DRAM that requires micromachining technology. Since its etching selectivity is higher than those of other gases, CH3F is suitable for micromachining of multi-layer structure of 3D NAND flash. The demand for CH3F has been increasing these days due to start-up of many lines to manufacture 3D NAND flash.
