High Purity Gas with Cylinder Electronic Grade R23 Trifluoromethane CHF3 Gas

Trifluoromethane

Trifluoromethane is used as a very low-temperature refrigerant and a cleaning and etchant agent in the semiconductor industry.

Process

The commercial production of trifluoromethane is carried out by reaction of chloroform with hydrogen fluoride over a chromium catalyst.

Specification & Package

Cylinder

10L 8kg/ 44L 32KG

DISS716

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CHF3