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Product Information：
Carbon tetrafluorideis a cryogenic refrigerant that is relatively inert under normal conditions, an oxygen displacer, and is also used in various wafer etching processes.
CF4 is currently the most widely used plasma etching gas in the microelectronics industry. It can be widely used in the etching of thin film materials such as silicon, silicon dioxide, silicon nitride, phosphosilicate glass and tungsten, and in surface cleaning of electronic devices and solar cells. It is also widely used in the production of laser technology, gas phase insulation, low-temperature refrigeration, leak detection agents, controlling the attitude of space rockets, and decontamination agents in printed circuit production.
Due to the chemical stability of carbon tetrafluoride, carbon tetrafluoride can be used in metal smelting and plastic industries
