Эксимерный лазерный газ KrF 248 нм TUIMIX-CTMN-KrF-V2.0 Смесь газа F2, криптон, гелий, неон Россия
Эксимерные газы для частичных моделей | |||
Марка | Длина волны | цилиндр | Valve |
ПОСЛЕДОВАТЕЛЬНЫЙ | 248nm | 10 л | DIN 8/JIS |
Б и Л | 193nm | 20 L / 50 L | DIN 8/DIN 14 |
ЦЕЙС | 193nm | 10л/20л | DIN 8 |
ВИСКС | 193nm | 16 л | CGA 679 |
НИДЕК | 193nm | 16 л | CGA 679 |
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The argon fluoride (KrF) laser is a type of excimer laser. Excimer lasers (short for "excited dimer") consist of a mixture of noble gas such as xenon, krypton or argon and a halogen gas such as chlorine or fluorine, which when subjected to high pressure and electrical stimulation emit stimulated ultraviolet (UV) light in the range of 248 nm.
Категория
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Компонент (%)
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Балансовый газ
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||
Лазерная смесь He-Ne
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2~8.3 Не
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He
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||
Газовая смесь для лазеров CO2
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0.4H2+ 13.5CO2+ 4.5Kr
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/
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0.4 H2+ 13CO2+ 7Kr+ 2CO
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0.4 H2+ 8CO2+ 8Kr+ 4CO
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0.4 H2+ 6CO2+ 8Kr+ 2CO
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0.4 H2+ 16CO2+ 16Kr+ 4CO
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0.4 H2+ 8~12CO2+ 8~12Kr
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Лазерная газовая смесь Кр-Ф2
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5 Кр+ 10 Ф2
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/
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5 Кр+ 1~0.2 F2
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Лазерный газ с герметичным лучом
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18.5N2+ 3Xe+ 2.5CO
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/
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Эксимерный лазер
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25.8Ne+ 9.8Ar+ 0.004N2+ 1F2
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Ar
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25.8Ne+ 9.8Ar+ 0.004N2+ 5F2
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He
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25.8Ne+ 9.8Ar+ 0.004N2+ 0.2F2
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He
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25.8Ne+ 9.8Ar+ 0.004N2+ 5HCl
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A
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Эксимерные газы для частичных моделей
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|||
Марка
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Длина волны
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цилиндр
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Valve
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ПОСЛЕДОВАТЕЛЬНЫЙ
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248nm
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10 л
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DIN 8/JIS
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Б и Л
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193nm
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20 L / 50 L
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DIN 8/DIN 14
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ЦЕЙС
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193nm
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10л/20л
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DIN 8
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ВИСКС
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193nm
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16 л
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CGA 679
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НИДЕК
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193nm
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16 л
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CGA 679
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ЛАЗЕРНЫЙ ПРИЦЕЛ
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193nm
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10 л
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CGA 679
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Алкон
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193nm
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16 л
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CGA 679
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ШВИНД
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193nm
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20 л
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DIN 8/DIN 14
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САММИТ
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193nm
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16 л
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CGA 679
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Organic compounds and biological matters easily absorb the UV light emitted by the ArF laser. This laser splits up the molecular bonds of tissues, which later disintegrates into the air via ablation in a controlled manner, instead of burning. Therefore, the ArF lasers have a potential to eliminate fine layers of surface material without heating. This property enables ArF excimer lasers to be commonly used in high-resolution photolithography machines, a technology that is critical for microelectronic chip manufacturing for opthalmological application. Other applications of ArF laser include the production of semiconductor integrated circuits. It also facilitates in situ analysis of mineral samples based on the ablation process.
Бренд: АГЕМ
AGEM is proud presenting the Excimer Laser Gas KrF 248nm TUIMIX-CTMN-KrF-V2.0 Mixture Gas F2,Krypton,Helium,Neon, and mixture this is certainly promises that are innovative revolutionize laser technology. This mixture of fluorine (F2), krypton, helium, and neon provide effectiveness accuracy unparalleled a lot of applications.
In the middle using this Excimer Laser Gas KrF 248nm TUIMIX-CTMN-KrF-V2.0 Mixture Gas F2,Krypton,Helium,Neon could be the KrF 248nm excimer laser, which produces a high-power beam that may vaporize and ablate materials with extreme precision. The TUIMIX-CTMN-KrF-V2.0 gasoline mixture enhances this process by giving a far more stable, uniform production that reduces waste and increases throughput.
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Clients who find the Excimer Laser Gas KrF 248nm TUIMIX-CTMN-KrF-V2.0 Mixture Gas F2,Krypton,Helium,Neon can get client this is certainly outstanding AGEM. Most of us of specialists is provided to answer any concerns that are appropriate help that is provide guarantee that the product is incorporated smoothly to your workflow. We also provide competitive prices and shipping this is certainly flexible suit your desires that are individual.