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ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz Excimer Laser Gas cylindrici
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ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz
Excimer laser mixturae gasi mixturae rariores vapores (argon, krypton, xenon, vel neon) et vapores halogeni (fluorini vel chlorini). Mixtio gasorum ad necem DUV lucis productae determinat. Argon+fluorinum+neon (193nm) et Krypton+fluorinum+neon (248nm) sunt duo mixtura frequentissima adhibita. in tomo culo; Neo facit circiter 96-97.5% mixtionis.
Excimer laser mixturae gasi mixturae rariores vapores (argon, krypton, xenon, vel neon) et vapores halogeni (fluorini vel chlorini). Mixtio gasorum ad necem DUV lucis productae determinat. Argon+fluorinum+neon (193nm) et Krypton+fluorinum+neon (248nm) sunt duo mixtura frequentissima adhibita. in tomo culo; Neo facit circiter 96-97.5% mixtionis.
Category |
Pars (%) |
Libra Gas |
He-Ne Laser Mixture Gas |
2~8.3 Ne |
He |
CO2 Laser Mixture Gas |
0.4H2+ 13.5CO2+ 4.5Kr |
/ |
0.4 H2+ 13CO2+ 7Kr+ 2CO |
||
0.4 H2+ 8CO2+ 8Kr+ 4CO |
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0.4 H2+ 6CO2+ 8Kr+ 2CO |
||
0.4 H2+ 16CO2+ 16Kr+ 4CO |
||
0.4 H2+ 8~12CO2+ 8~12Kr |
||
Kr-F2 Laser Mixtura Gas |
5 Kr+ 10 F2 |
/ |
5 Kr+ 1~0.2 F2 |
||
Tignum laser Gas |
18.5N2+ 3Xe+ 2.5CO |
/ |
Laser Excimer |
25.8Ne+ 9.8Ar+ 0.004N2+ 1F2 |
Ar |
25.8Ne+ 9.8Ar+ 0.004N2+ 5F2 |
He |
|
25.8Ne+ 9.8Ar+ 0.004N2+ 0.2F2 |
He |
|
25.8Ne+ 9.8Ar+ 0.004N2+ 5HCl |
A |
Excimer gasorum exempla partiales |
||||||
Brand |
necem |
cylindro |
CYMBALON |
|||
COHERENS |
193nm |
20 I. |
Signa 8 |
|||
B & L |
193nm |
20 L / L LXVIII |
DIN 8/DIN 14 |
|||
ZEISS |
193nm |
10L/20 L |
Signa 8 |
|||
VISX |
193nm |
16 I. |
679 CGA |
|||
Nidek |
193nm |
16 I. |
679 CGA |
|||
LASERSIGHT |
193nm |
10 I. |
679 CGA |
|||
Alconis habes |
193nm |
16 I. |
679 CGA |
|||
SCHWIND |
193nm |
20 I. |
DIN 8/DIN 14 |
|||
CAPUT |
193nm |
16 I. |
679 CGA |
|||
Aliae applicationes ArF laseris productio semiconductoris circuitus integrati includunt. Etiam in situ analysis exemplorum mineralium secundum ablationem processus adiuvat.
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