Air Gas Electronic Materials Enterprise Co., Ltd.

Page 1:What Is Plasma Etching? 

Hey guys, so have you ever heard of a thing called plasma etching? Plasma etching is a process we used to produce electronics, such as computer chips found inside tablets and cellular devices. Using a method called lithography, tiny designs or patterns are carved onto materials — an integral step in developing these devices. This etching requires a specific gas that can chemically interact with the material we are using. The gas that we use most importantly when doing this process is called C3F8. 

C3F8 is an exciting gas because it reacts very quickly with the substances we want to etch. That means it accelerates the etching significantly than using other gases. If we operate with C3F8, we receive extremely clean and accurate etchings of the designs. This precision really comes in handy to manufacture chips of a computer, and other electronic devices which need to perform tasks accurately. 

C3F8: Improving Etching Performance 

In this context, C3F8 acts as an auxiliary gas to enhance the efficiency of the etching. C3F8 has a role in preventing the gas plasma from coming into contact with the etching chamber walls. The thing is, plasma touching to walls can increase the time of etching up a little. When C3F8 is applied, it directs the plasma right at what needs to be etched. This will greatly accelerate and smoothen the entire process. 

C3F8 also has the additional benefit of excellent stability. This translates to durability, and it will hold its insulating properties for many years. Thus, Using C3F8 will not only accelerate the etching but also allow a maintaining homogeneous quality. 

[[STIR] Surface Functionalization Page 3: CH4 Application of C3F8 Making Small Computer Chips 

Have you ever thought about how they manufacture those small computer chips? That means drawing crystalline patterns—very small ones—on a silicon chip. This silicon is a principal electronic material. C3F8 is extremely valuable for this process because it can achieve very sharp and clean etchings. That matters, because the computer chip must have its patterns just right for it to function properly. 

Because of C3F8, manufacturers can create these small patterns in an accurate and reproducible way. Which means every chip can function normally. C3F8 is also a very versatile etchant, as it can etch many different materials. This enables producers to produce diverse electronic items along with smart phones as well as tablets. 

C3F8 – The Ideal Gas for Isolation 

When it comes to gas block, C3F8 is not only effective but also a good alternative. Since it is highly stable in nature and can be used repeatedly, it is also a very inexpensive solution. This means that manufacturers need to purchase less C3F8 instead of buying more expensive gases. This allows companies to reduce the costs of retention while attaining optimal results with saved-up C3F8. 

In addition, C3F8 is extremely environmentally friendly. This is not a good news at all for global warming which is the most worrisome issue in nowadays world. C3F8 has a distinct advantage over most other gases in that it does not emit toxic chemicals into the air. That makes it ideal pick for responsible manufacturers who want to go green while producing their products. 

C3F8 Does Better and Quicker Etching 

Indeed, C3F8 is the perfect etching gas because it gives a very fast and precise process for many materials. This translates to a quicker time for manufacturers to build multiple electronic devices. With C3F8, they can also save money while being sustainable too.