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ArF F2 Argon Mixture Gas Laser For Alcon Allegretto Wavelight 400Hz Excimer Laser Gas κύλινδρος
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Introducing, the AGEM’s ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz Excimer Laser Gas cylinder. This product has been designed to provide excellent performance for your laser system. With its potent blend of ArF F2 and Argon Mixture, this cylinder offers remarkable reliability and stability.
AGEM’s ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz Excimer Laser Gas cylinder is compatible with a wide range of laser systems, including the Alcon Allegretto Wavelight 400Hz Excimer Laser. This product has been engineered to offer superior performance over an extended period, reducing the likelihood of system failure or downtime due to gas instability.
The cylinder employs high-quality materials that ensure that the gas is pure and free from impurities. These materials have been carefully selected to guarantee that the gas is not contaminated by any contaminants, which could alter the characteristics of the laser beam.
AGEM’s ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz Excimer Laser Gas cylinder is also safe to use. The cylinder has been designed with safety in mind, incorporating features that prevent the gas from leaking or reacting with other substances. Additionally, the product is compliant with all necessary safety standards, ensuring that your system is secure and operates without risk to staff.
This product is also readily available at an affordable price. AGEM’s ArF F2 Argon Mixture Laser Gas For Alcon Allegretto Wavelight 400Hz Excimer Laser Gas cylinder is a competitively priced product that provides excellent value for your money. It offers an ideal combination of quality performance and affordability, allowing you to achieve superior results without incurring significant costs
Excimer laser gas mixtures are a combination of rare gases (argon, krypton, xenon, or neon) and halogen gases (fluorine or chlorine). The mixture of gases determines the wavelength of DUV light produced. Argon+fluorine+neon (193nm) and Krypton+fluorine+neon (248nm) are the two most common mixtures used. In terms of volume; neon makes up approximately 96–97.5% of the mixture
κατηγορία | Component % | Αέριο ισορροπίας | ||
He-Ne Laser Mixture Gas | 2~8.3 Νέ | He | ||
Αέριο μίγματος λέιζερ CO2 | 0.4H2+ 13.5CO2+ 4.5Kr | / | ||
0.4 H2+ 13CO2+ 7Kr+ 2CO | ||||
0.4 H2+ 8CO2+ 8Kr+ 4CO | ||||
0.4 H2+ 6CO2+ 8Kr+ 2CO | ||||
0.4 H2+ 16CO2+ 16Kr+ 4CO | ||||
0.4 H2+ 8~12CO2+ 8~12Kr | ||||
Kr-F2 Laser Mixture Gas | 5 Kr+ 10 F2 | / | ||
5 Kr+ 1~0.2 F2 | ||||
Σφραγισμένο αέριο λέιζερ δέσμης | 18.5N2+ 3Xe+ 2.5CO | / | ||
Λέιζερ Excimer | 25.8Ne+ 9.8Ar+ 0.004N2+ 1F2 | Ar | ||
25.8Ne+ 9.8Ar+ 0.004N2+ 5F2 | He | |||
25.8Ne+ 9.8Ar+ 0.004N2+ 0.2F2 | He | |||
25.8Ne+ 9.8Ar+ 0.004N2+ 5HCl | A |
Excimer αέρια για μερικά μοντέλα | ||||||
Μάρκα | Μήκος κύματος | Κύλινδρος | Βαλβίδα | |||
ΣΥΝΑΦΗΣ | 193nm | 20 L | DIN 8 | |||
B & L | 193nm | 20 L/50 L | DIN 8/ DIN 14 | |||
ZEISS | 193nm | 10 λίτρα/20 λίτρα | DIN 8 | |||
VISX | 193nm | 16 L | CGA 679 | |||
ΝΙΔΕΚ | 193nm | 16 L | CGA 679 | |||
LASERSIGHT | 193nm | 10 L | CGA 679 | |||
Alcon | 193nm | 16 L | CGA 679 | |||
SCHWIND | 193nm | 20 L | DIN 8/ DIN 14 | |||
SUMMIT | 193nm | 16 L | CGA 679 | |||
Other applications of ArF laser include the production of semiconductor integrated circuits. It also facilitates in situ analysis of mineral samples based on the ablation process
